Defect–Coating–Wavelength Coupling Effects on Nano-Scale Electric Field Modulation in Fused Silica Under Multi-Wavelength Irradiation

W4415564370 · 수집 2026-10-04 18:16:49

T10732 Laser Material Processing Techniques

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Fused silica optical components with antireflection (AR) coatings are key components in high-power laser systems. However, their reliability is severely challenged by multi-wavelength irradiation and the presence of unavoidable matrix surface defects. To investigate the coupling effects of electric field modulation between multi-wavelength irradiation, AR coating layers, and defects in AR-coated fused silica, this paper uses the finite-difference time-domain (FDTD) method to simulate the nanoscale electric field intensity distribution in fused silica coated with a double-layer AR coating at three different design wavelengths using multi-wavelength lasers. The effects of electric field coupling between the coating layers and defects are analyzed for three representative scratch geometries. The results show that when the incident wavelength matches the AR design wavelength, the interface field is effectively suppressed, resulting in a smoother field distribution and localized hot spots. Conversely, mismatched wavelengths induce severe field distortion, producing multiple hot spots and lateral interference fringes. Wide, shallow scratches are particularly sensitive to wavelength mismatch, with a 532 nm AR coating exhibiting a global maximum enhancement factor of 1.63442 for 355 nm incident light. These findings highlight the coupling effects of scratch geometry, AR coating dispersion, and laser wavelength on electric field modulation. This research provides valuable insights for optimizing antireflection coatings and improving defect tolerance in multi-wavelength laser applications, helping to improve the reliability of high-power laser systems.

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