TiO2, SiO2, and Al2O3coated nanopores and nanotubes produced by ALD in etched ion-track membranes for transport measurements

W2101049053 · 수집 2026-10-04 18:12:19

T10409 Fuel Cells and Related Materials

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Low-temperature atomic layer deposition (ALD) of TiO2, SiO2, and Al2O3 was applied to modify the surface and to tailor the diameter of nanochannels in etched ion-track polycarbonate membranes. The homogeneity, conformity, and composition of the coating inside the nanochannels are investigated for different channel diameters (18–55 nm) and film thicknesses (5–22 nm). Small angle x-ray scattering before and after ALD demonstrates conformal coating along the full channel length. X-ray photoelectron spectroscopy and energy dispersive x-ray spectroscopy provide evidence of nearly stoichiometric composition of the different coatings. By wet-chemical methods, the ALD-deposited film is released from the supporting polymer templates providing 30 μm long self-supporting nanotubes with walls as thin as 5 nm. Electrolytic ion-conductivity measurements provide proof-of-concept that combining ALD coating with ion-track nanotechnology offers promising perspectives for single-pore applications by controlled shrinking of an oversized pore to a preferred smaller diameter and fine-tuning of the chemical and physical nature of the inner channel surface.

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TiO<sub>2</sub>, SiO<sub>2</sub>, and Al<sub>2</sub>O<sub>3</sub>coated nanopores and nanotubes produced by ALD in etched ion-track membranes for transport measurements

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